SiO2 to Si selectivity mechanisms in high density fluorocarbon plasma etching

TitleSiO2 to Si selectivity mechanisms in high density fluorocarbon plasma etching
Publication TypeJournal Article
Year of Publication1996
AuthorsKirmse, KHR, Wendt, AE, Disch, SB, Wu, JZ, Abraham, IC, Meyer, JA, Breun, RA, Woods, RC
JournalJournal of Vacuum Science & Technology B
Volume14
Pagination710-715
Date PublishedMar-Apr
ISBN Number1071-1023
Accession NumberWOS:A1996UH89000022