Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography

TitleResist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography
Publication TypeJournal Article
Year of Publication2010
AuthorsHan, E, Leolukman, M, Kim, M, Gopalan, P
JournalACS Nano
Volume4
Pagination6527-6534
ISBN Number1936-0851
Accession Number2010:1311688