Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness

TitlePixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness
Publication TypeJournal Article
Year of Publication2007
AuthorsLa, Y-H, Park, S-M, Meagley, RP, Leolukman, M, Gopalan, P, Nealey, PF
JournalJournal of Vacuum Science & Technology B
Volume25
Pagination2508-2513
Date PublishedNov
Accession NumberISI:000251611900149