Impact of thermal annealing on internal device parameters of GaAs0.965Bi0.035/GaAs0.75P0.25 quantum well lasers

TitleImpact of thermal annealing on internal device parameters of GaAs0.965Bi0.035/GaAs0.75P0.25 quantum well lasers
Publication TypeJournal Article
Year of Publication2019
AuthorsKim, H, Guan, YX, Kuech, TF, Mawst, LJ
JournalIet Optoelectronics
Volume13
Pagination12-16
Date PublishedFeb
ISBN Number1751-8768
DOI10.1049/iet-opt.2018.5031