DISILANE - A NEW SILICON DOPING SOURCE IN METALORGANIC CHEMICAL VAPOR-DEPOSITION OF GAAS

TitleDISILANE - A NEW SILICON DOPING SOURCE IN METALORGANIC CHEMICAL VAPOR-DEPOSITION OF GAAS
Publication TypeJournal Article
Year of Publication1984
AuthorsKuech, TF, Meyerson, BS, Veuhoff, E
JournalApplied Physics Letters
Volume44
Pagination986-988
ISBN Number0003-6951
DOI10.1063/1.94621